In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
For the first time in history, a pathway for ALD-enhanced materials to be rapidly developed and transitioned from lab-scale to commercial production is available for nearly any application. Until ...
Chemical vapor deposition (CVD) is a process widely used in the manufacturing of electronic and energy devices as it is able to form conducting, semiconducting and dielectric thin films. Here, in the ...
AI-driven process monitoring enhances the qualification of additively manufactured stainless-steel parts. By analysing high-frequency welding current and voltage signals in both the time and frequency ...
Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...
A technical paper titled “Quantified Uniformity and Selectivity of TiO 2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles” was published by researchers at IMEC, North ...